Mark Neisser, Ph.D
Contact Information:
markthu@mail.tsinghua.edu.cn
Personal Profile
He is chair Professor in the School of Integrated Circuits. He teaches courses in lithography and photoresist at Tsingha University in Beijing. He has performed and managed R&D for most of his career, including at IBM, AZ Electronic Materials and SEMATECH. He is an expert in both lithography and lithographic materials such as photoresist, antireflective coatings, and spin on etch masks. He received his B.S. degree in chemistry from the Cornell University and his M.S. and Ph.D. degrees in chemistry from the University of Michigan. He is the author of more than 30 patents, over 100 journal papers and has co-authored two book chapters. He is the chairman of the IRDS roadmap lithography committee. He also is a director at the International Institute of Tsinghua University, Shanghai.
Research Interests
Current areas of active research are in novel materials such as metal containing photoresists, the reactive ion etch processing of such materials, and in understanding photoresist mechanisms of action. Dr. Neisser is also interested in the issues of stochastics in advanced lithography, and in modeling photoresists. Recent publications include ones on the IRDS lithography roadmap, and the mechanism of photo decomposable bases used as resist additives. Some recent references are shown below.
• M. Neisser et al., “How lithography and metrology are enabling yield in the next generation of semiconductor patterning,” Computer, vol. 57, no. 1, pp. 51–58, Jan. 2024, doi: 10.1109/MC.2023.3312767
• Journal of Photopolymer Science anaind Technology “Theory of Photodecomposable Base in Chemically Amplified Resist”, Journal of Photopolymer Science and Technology Vol. 36, No. 5 (2023) pp. 329-336
• The International Roadmap for Devices and Systems (IRDS), Lithography and Patterning, 2023 Update. 2023. https://irds.ieee.org.
• IEEE. The International Roadmap for Devices and Systems (IRDS), Executive Summary, 2023 Update. 2023. https://irds.ieee.org.
• Mark Neisser, Harry J. Levinson, "Projecting EUV photo-speeds for future logic nodes," Proc. SPIE 11323, Extreme Ultraviolet (EUV) Lithography XI, 113231N (23 March 2020);
https://doi.org/10.1117/12.2551311